New Nanofabrication Technology Opens Up New Research Possibilities
This webinar will demonstrate the unique capabilities of Nanofrazor thermal Scanning Probe Lithography technology for quick and easy fabrication of high resolution nanopatterns and devices that were not previously possible. It will also include a real-time nanofabrication demonstration.
Thermal scanning probe lithography (t-SPL) has recently entered the lithography market as first true alternative or extension to electron beam lithography (EBL). The first dedicated t-SPL systems, called NanoFrazor, have been installed at research facilities in Europe, America, Asia and Australia by the company SwissLitho, a spinoff company of ETH Zurich.
Core of the technology – which has its origins at IBM Research and their Millipede project – is a heatable ultra-sharp probe tip which is used for patterning and simultaneous inspection of complex nanostructures. The heated tip creates arbitrary depth, high-resolution (<10 nm half-pitch) nanostructures by local evaporation of resist materials. Using an integrated in-situ metrology method, the patterning depth can be controlled with 1 nm accuracy. This enables patterning of extremely accurate 3D nanostructures in a single step without wet development. The patterning speed is comparable to high resolution EBL.
The application range for this new nanofabrication capability is broad and will be demonstrated by way of a number of examples:
- 3D Phase plates and finely tuned optical microcavities
- Nanofluidic devices
- Plasmonic structures
- Nanoelectronic devices
Finally, the operation of the NanoFrazor will be shown in real time via a remote connection to a NanoFrazor system. The patterning and inspection of precise 3D patterns and the accurate overlay of electrodes on nanowires will be demonstrated within just a few minutes.
The webinar will be held on Thursday August 17
3pm Sydney, Melbourne, Canberra, Brisbane, 2.30pm Adelaide AEST, 1pm Perth
There is NO COST to attend.
Login details will be provided to all registrants.
Presenter – Dr. Felix Holzner, CEO, Swisslitho (Switzerlans)
Felix Holzner studied physics in New Zealand and Germany and received a PhD from ETH Zurich. In 2009, he joined the Nanofabrication Group at the IBM Research Laboratory in Zurich where he started to work on Thermal Scanning Probe Lithography. After several technological breakthroughs, Felix shortened the name of the technology to “NanoFrazor” and founded SwissLitho in 2012 with the clear vision to enable superior nanofabrication for everyone. He strongly believes that the unique capabilities of the NanoFrazor enable new science and eventually even products not conceivable today.
Felix has a complete overview over all possible nanolithography technologies and a very deep understanding of the NanoFrazor technology and its applications. He is a regular invited speaker at international conferences. Felix received the IBM Plateau Invention Achievement Award and the ETH Pioneer Fellowship in 2012 and 2013, respectively. With SwissLitho and the NanoFrazor, he has won numerous of the most prestigious startup and technology awards exceeding prize money of 500,000 CHF.